Assignment of Assignor's Interest

Recorded: 2004-12-03 Pages: 2

Assignor

PUECH, MICHEL

Executed: 2004-10-18

Assignee

ALCATEL

54, RUE LA BOETIE, 75008 PARIS, FRANCE

Covered Property (1)

Method and device for substrate etching with very high power inductively coupled plasma

Application: 10/516,455 →

Publication: US 2006/0060566

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.