Assignment of Assignor's Interest

Recorded: 2005-12-30 Pages: 3

Assignor

BANG, KI WAN

Executed: 2005-12-27

Assignee

DONGBUANAM SEMICONDUCTOR INC.

891-10, DAECHI-DONG, KANGNAM-KU, SEOUL, KOREA, REPUBLIC OF

Covered Property (1)

Method for forming salicide layer in semiconductor device

Application: 11/320,779 →

Publication: US 2006/0148228

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.