Patent Assignment
Reel/Frame 018176/0351
Change of Name
Recorded: 2006-06-15
Pages: 14
Assignor
DONGBUANAM SEMICONDUCTOR INC.
Executed: 2006-03-24
Assignee
DONGBU ELECTRONICS CO., LTD.
891-10 DAECHI-DONG, KANGNAM-KU, SEOUL, KOREA, REPUBLIC OF
Covered Properties
(146)
Semiconductor device and method for fabricating the same
Application:
11/197,331 →
Publication:
US 2006/0030101
Copper Line of Semiconductor Device and Method for Forming the Same
A Method for Stripping Silicon Nitride
Method for forming patterns on a semiconductor device
Application:
11/246,239 →
Publication:
US 2006/0134559
Cmos Image Sensor and Method for Fabricating the Same
Cmos Image Sensor and Method for Fabricating the Same
Method for fabricating CMOS image sensor
Application:
11/280,318 →
Publication:
US 2006/0110873
Image Sensor and Method for Fabricationg the Same
Method for Manufacturing Semiconductor Device
Cmos Image Sensor and Manufacturing Method Thereof
Metal Wiring for Semiconductor Device and Method for Forming the Same
Method for Fabricating Metal-Insulator-Metal Capacitor of Semiconductor Device with Reduced Patterning Steps
Method of fabricating metal-insulator-metal capacitor
Application:
11/300,437 →
Publication:
US 2006/0134878
Thin Film Transistor and Method for Manufacturing the Same
Cmos Image Sensor and Method for Fabricating the Same
Method for reforming color filter array of a CMOS image sensor
Application:
11/302,388 →
Publication:
US 2006/0126005
Method of Fabricating a Semiconductor Device
Cmos Image Sensor and Method for Fabricating the Same
Method for Forming Metal Line of Semiconductor Device
CMOS image sensor and fabricating method thereof
Application:
11/312,355 →
Publication:
US 2006/0138412
Method for fabricating a CMOS image sensor
Application:
11/312,448 →
Publication:
US 2006/0141654
Method of fabricating semiconductor device
Application:
11/312,504 →
Publication:
US 2006/0141719
Method for forming metal line of semiconductor device
Application:
11/312,506 →
Publication:
US 2006/0141769
Method for Fabricating Semiconductor Device
Semiconductor Device and Method for Manufacturing the Same
CMOS image sensor and method for fabricating the same
Application:
11/312,600 →
Publication:
US 2006/0131598
Method of Manufacturing a Sonos Device
CMOS image sensor and method for fabricating the same
Application:
11/314,346 →
Publication:
US 2006/0145206
Method for Forming Metal Interconnection of Semiconductor Device
High-voltage transistor and fabricating method thereof
Application:
11/314,365 →
Publication:
US 2006/0138549
Semiconductor device and fabricating method thereof
Application:
11/314,414 →
Publication:
US 2006/0138469
CMOS image sensor and method for fabricating the same
Application:
11/315,147 →
Publication:
US 2006/0141660
Flash Memory Cell and Method for Manufacturing the Same
CMOS image sensor and method for fabricating the same
Application:
11/315,149 →
Publication:
US 2006/0138486
Cmos Image Sensor and Method for Fabricating the Same
CMOS image sensor and method for fabricating the same
Application:
11/315,158 →
Publication:
US 2006/0138487
Cmos Image Sensor and Method for Manufacturing the Same
Method for Fabricating Cmos Image Sensor
Method for Making Mask in Process of Fabricating Semiconductor Device
Semiconductor Device and Method for Manufacturing the Same
CMOS image sensor and method for fabricating the same
Application:
11/318,432 →
Publication:
US 2006/0138490
Method of Fabricating Low-Power Cmos Device
Cmos Image Sensor and Method of Fabricating the Same
CMOS image sensor and method for fabricating the same
Application:
11/318,439 →
Publication:
US 2006/0138470
Semiconductor Device
Method for Fabricating a Semiconductor Device
CMOS image sensor and method for fabricating the same
Application:
11/318,445 →
Publication:
US 2006/0138578
Cmos Image Sensor and Method for Fabricating the Same
Cmos Image Sensor
Method for Fabricating Cmos Image Sensor
Method of Fabricating Mos Transistor
Cmos Image Sensor and Method for Manufacturing the Same
CMOS image sensor and method for fabricating the same
Application:
11/318,575 →
Publication:
US 2006/0138492
Cmos Image Sensor and Method for Fabricating the Same
Nonvolatile memory device, method for fabricating the same, and method for programming/erasing data in the same
Application:
11/318,578 →
Publication:
US 2006/0138534
Method of Fabricating Cmos Image Sensor
Cmos Image Sensor and Method for Fabricating the Same
Cmos Image Sensor and Method for Fabricating the Same
Sputtering Apparatus and Method for Forming Metal Silicide Layer Using the Same
Method for Forming Isolation Trench in a Semiconductor Substrate
Semiconductor transistor device and method for manufacturing the same
Application:
11/319,229 →
Publication:
US 2006/0141721
Method of Fabricating Fin Field-Effect Transistors
CMOS image sensor and method for fabricating the same
Application:
11/319,262 →
Publication:
US 2006/0145197
Fin field-effect transistor and method for fabricating the same
Application:
11/319,263 →
Publication:
US 2006/0145259
Semiconductor device manufacturing method
Application:
11/319,264 →
Publication:
US 2006/0148148
Photodiode in CMOS image sensor and method of manufacturing the same
Application:
11/319,265 →
Publication:
US 2006/0145208
Cmos Image Sensor and Fabricating Method Thereof
LDMOS transistor
Application:
11/319,478 →
Publication:
US 2006/0145248
Ldmos Transistor
Capacitor and Method for Fabricating the Same
Manufacturing isolation layer in CMOS image sensor
Application:
11/319,483 →
Publication:
US 2006/0148195
Flash Eeprom Device and Method for Fabricating the Same
LDMOS transistor
Application:
11/319,486 →
Publication:
US 2006/0145249
Cmos Image Sensor and Method for Manufacturing the Same
CMOS image sensor and method for fabricating the same
Application:
11/319,488 →
Publication:
US 2006/0145204
Method of Manufacturing Semiconductor Devices
Cmos Image Sensor and Method for Fabricating the Same
Image Sensor Having Inner Lens
Method for Manufacturing Semiconductor Device Including Mim Capacitor
Microlens of Cmos Image Sensor and Method of Manufacturing the Same
Image Sensor and Method for Fabricating the Same
Image Sensor and Method for Fabricating the Same
CMOS image sensor and method for manufacturing the same
Application:
11/319,496 →
Publication:
US 2006/0145278
A Method of Fabricating a Mask Rom
Image sensor having diffractive lens and method for fabricating the same
Application:
11/319,498 →
Publication:
US 2006/0145056
Fabricating Method of Cmos Image Sensor
Image sensor having color wheel
Application:
11/319,571 →
Publication:
US 2006/0146381
Semiconductor Device and Method for Fabricating the Same
Cmos Image Sensor and Method for Fabricating the Same
Cmos Image Sensor and Method for Manufacturing the Same
Cmos Image Sensor and Method for Fabricating the Same
Method of Dual Bird's Beak Locos Isolation
Chain resistance pattern and method of forming the same
Application:
11/319,589 →
Publication:
US 2006/0148113
Cmos Image Sensor and Fabricating Method Thereof
Photodiode of Cmos Image Sensor and Method for Manufacturing the Same
Cmos Image Sensor
Voltage-Dividing Resistor and Semiconductor Device Having the Same
System for detecting film quality variation and method using the same
Application:
11/319,594 →
Publication:
US 2006/0144818
Mos Transistor and Method of Manufacturing the Same
Cmos Image Sensor and Method for Manufacturing the Same
CMOS image sensor and method for manufacturing the same
Application:
11/319,597 →
Publication:
US 2006/0148122
Image Sensor Including Microlens Having Sizes Differing According to Deposition of Color Filter Array
Cmos Image Sensor and Method for Fabricating the Same
Mask Rom, Method for Fabricating the Same, and Method for Coding the Same
Cmos Image Sensor Having Improved Signal Efficiency and Method for Manufacturing the Same
Method for fabricating a semiconductor device
Application:
11/320,337 →
Publication:
US 2006/0148237
CMOS image sensor and method for fabricating the same
Application:
11/320,343 →
Publication:
US 2006/0145220
Image sensor using optical fiber
Application:
11/320,448 →
Publication:
US 2006/0145077
Method for Fabricating Semiconductor Device
Image sensor having square microlens
Application:
11/320,465 →
Publication:
US 2006/0146412
Cmos Image Sensor and Method for Fabricating the Same
Cmos Image Sensor and Method for Manufacturing the Same
Method for Fabricating Cmos Image Sensor
Method for cleaning a semiconductor substrate
Application:
11/320,483 →
Publication:
US 2006/0148244
Cmos Image Sensor Having Photodiode and Method for Manufacturing the Same
Semiconductor Device Having High-Voltage Transistor and Pip Capacitor and Method for Fabricating the Same
Flash Memory Device and Method for Fabricating the Same
Method for Patterning Low Dielectric Layer of Semiconductor Device
Method for fabricating a semiconductor device
Application:
11/320,679 →
Publication:
US 2007/0117376
Cmos Image Sensor and Method of Manufacturing the Same
Cmos Image Sensor and Method for Fabricating the Same
Cmos Image Sensor and Method for Fabricating the Same
Methods of fabricating a fully silicided gate and semiconductor memory device having the same
Application:
11/320,704 →
Publication:
US 2007/0077756
Method of forming metal wiring in a semiconductor device
Application:
11/320,705 →
Publication:
US 2007/0077755
Method for manufacturing high voltage transistor
Application:
11/320,727 →
Publication:
US 2006/0148185
Device for detecting contamination of lens in exposure device
Application:
11/320,738 →
Publication:
US 2007/0091303
Method of fabricating CMOS image sensor
Application:
11/320,739 →
Publication:
US 2006/0183266
Method for manufacturing semiconductor device
Application:
11/320,740 →
Publication:
US 2007/0059902
Flash Memory Device and Method for Fabricating the Same
Patent:
7,199,034 →
Application:
11/320,741 →
Metal line for a semiconductor device and fabrication method thereof
Application:
11/320,763 →
Publication:
US 2007/0052098
Cmos Image Sensor and Method for Fabricating the Same
Method for Fabricating Semiconductor Device
Method of forming metal wiring in semiconductor device
Application:
11/320,773 →
Publication:
US 2007/0077757
Method for forming LDMOS channel
Application:
11/320,774 →
Publication:
US 2006/0148184
Method for forming salicide layer in semiconductor device
Application:
11/320,779 →
Publication:
US 2006/0148228
Method of fabricating a flash memory device
Application:
11/320,780 →
Publication:
US 2006/0148171
Method for manufacturing semiconductor device
Application:
11/320,781 →
Publication:
US 2006/0148222
Method for Manufacturing Semiconductor Device
Method for fabricating CMOS image sensor
Application:
11/320,904 →
Publication:
US 2006/0148123
Method for Fabricating Nonvolatile Memory Device
Image Sensor and Fabricating Method Thereof
Fabricating Method of Semiconductor Device
Method of fabricating an image sensor having a capping layer formed on the microlens being removed in the pad area.
Application:
11/320,948 →
Publication:
US 2007/0102716
Methods of fabricating fully silicide gate and semiconductor memory device having the same
Application:
11/320,949 →
Publication:
US 2007/0077740
Cleansing method of electrochemical plating cell
Application:
11/320,976 →
Publication:
US 2007/0060474
Method for Fabricating a Semiconductor Device
Related Assignments
(25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 5, 2005
From: SHIN, EUN JONG
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 016865/0611 →
Assignment of Assignor's Interest
Aug 11, 2005
From: CHOI, CHEE HONG
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 016859/0308 →
Assignment of Assignor's Interest
Sep 14, 2005
From: YIM, TERESA
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 016993/0413 →
Assignment of Assignor's Interest
Oct 11, 2005
From: HA, JEONG HYUK
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 017078/0183 →
Assignment of Assignor's Interest
Oct 17, 2005
From: HONG, CHANG YOUNG
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 017720/0938 →
Assignment of Assignor's Interest
Nov 17, 2005
From: HAN, CHANG HUN
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 017252/0699 →
Assignment of Assignor's Interest
Dec 5, 2005
From: KIM, SANG SIK
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 017324/0934 →
Assignment of Assignor's Interest
Dec 5, 2005
From: LEE, SANG-GI
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 017328/0327 →
Assignment of Assignor's Interest
Dec 5, 2005
From: LEE, HAN CHOON
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 017326/0288 →
Assignment of Assignor's Interest
Dec 8, 2005
From: HAN, JAE WON
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 017329/0108 →
Assignment of Assignor's Interest
Dec 8, 2005
From: SHIM, SANG CHUL
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 017305/0672 →
Assignment of Assignor's Interest
Dec 14, 2005
From: CHA, DONG KWON
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 017373/0282 →
Assignment of Assignor's Interest
Dec 14, 2005
From: KOH, KWAN JU
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 017363/0526 →
Assignment of Assignor's Interest
Dec 15, 2005
From: PARK, HYUK
To: DONGBU-ANAM SEMICONDUCTOR
Reel/Frame 017369/0496 →
Assignment of Assignor's Interest
Dec 15, 2005
From: KIM, TAE WOO
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 017369/0599 →
Assignment of Assignor's Interest
Dec 20, 2005
From: LIM, KEUN HYUK
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 017351/0963 →
Assignment of Assignor's Interest
Dec 21, 2005
From: LEE, JAE SUK
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 017402/0370 →
Assignment of Assignor's Interest
Dec 21, 2005
From: JUNG, MENG AN
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 017375/0524 →
Assignment of Assignor's Interest
Feb 12, 2007
From: LEE, KAE HOON
To: DONGBUANAM ELECTRONICS CO., LTD.
Reel/Frame 018915/0443 →
Assignment of Assignor's Interest
Apr 7, 2015
From: DONGBU ELECTRONICS CO., LTD.
To: III HOLDINGS 4, LLC
Reel/Frame 035383/0560 →
Merger
Apr 22, 2015
From: DONGBU ELECTRONICS CO., LTD.
To: DONGBU HITEK CO., LTD.
Reel/Frame 035469/0801 →
Assignment of Assignor's Interest
Apr 24, 2015
From: DONGBU HITEK CO., LTD.
To: STRATEGIC GLOBAL ADVISORS OF OREGON, INC.
Reel/Frame 035491/0744 →
Assignment of Assignor's Interest
May 12, 2015
From: STRATEGIC GLOBAL ADVISORS OF OREGON, INC.
To: TESSERA ADVANCED TECHNOLOGIES, INC.
Reel/Frame 035620/0771 →
Security Interest
Dec 2, 2016
From: INVENSAS CORPORATION; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; ZIPTRONIX, INC.
To: ROYAL BANK OF CANADA, AS COLLATERAL AGENT
Reel/Frame 040797/0001 →
Merger and Change of Name
Nov 29, 2017
From: DONGBU ELECTRONICS CO., LTD.; DONGBU HITEK CO., LTD.
To: DONGBU HITEK CO., LTD.
Reel/Frame 044533/0523 →