Patent Assignment
Reel/Frame 044533/0523
Merger and Change of Name
Recorded: 2017-11-29
Pages: 12
Assignors
DONGBU ELECTRONICS CO., LTD.
Executed: 2007-05-03
DONGBU HITEK CO., LTD.
Executed: 2007-05-03
Assignee
DONGBU HITEK CO., LTD.
DONGBU FINANCIAL CENTER 891-10, DAECHI-DONG, GANGNAM-GU, SEOUL, KOREA, REPUBLIC OF
Covered Properties
(191)
Mask Rom, and Fabrication Method Thereof
Method for Manufacturing Semiconductor Image Sensor with Color Filters and Bonding Pads
Short Channel Transistor Fabrication Method for Semiconductor Device
Cmp Slurry Composition and a Method for Planarizing Semiconductor Device Using the Same
Method for Forming an Mim Capacitor
Methods of Manufacturing Semiconductor Devices
Methods to Fabricate Semiconductor Devices
Methods for Fabricating a Semiconductor Device
Methods of Manufacturing Mosfets in Semiconductor Devices
Method for Manufacturing a Cmos Image Sensor
Method of Manufacturing a Cmos Image Sensor
Methods of Manufacturing Semiconductor Devices
Methods of Manufacturing Semiconductor Devices
Image Sensor Having Integrated Single Large Scale Pixel and Pixel Separation Pattern
Cmos Image Sensor and Method for Manufacturing the Same
Methods of Manufacturing and-Type Flash Memory Devices
Methods for Fabricating Nonvolatile Memory Devices
Methods for Forming a Device Isolating Barrier and Methods for Forming a Gate Electrode Using the Same
Mask Rom, and Fabrication Method Thereof
Method for Forming a Bonding Pad of a Semiconductor Device Including a Plasma Treatment
Methods for Fabricating Semiconductor Devices
Semiconductor Devices Having Diffusion Barrier Regions and Halo Implant Regions and Methods of Fabricating the Same
Method for Manufacturing Cmos Image Sensor
Method for Fabricating a Semiconductor Device Having Self Aligned Source (Sas) Crossing Trench
Cmos Image Sensor and Manufacturing Method Thereof
Cmos Image Sensor and Manufacturing Method Thereof
Methods for Fabricating an Interlayer Dielectric Layer of a Semiconductor Device
Cmos Image Sensors and Methods for Fabricating the Same
Semiconductor Devices and Methods of Fabricating the Same
Cmos Image Sensor and Method for Fabricating the Same
Semiconductor Device and Manufacturing Method Thereof
Methods of Forming Halo Regions in Nmos Transistors
Method for Fabricating Semiconductor Device
Device Isolation Method of Semiconductor Memory Device and Flash Memory Device Fabricating Method Using the Same
Semiconductor Device Having a Graded Ldd Region and Fabricating Method Thereof
Non-Volatile Memory Element with Oxide Stack and Non-Volatile Sram Using the Same
Image Sensor and Method for Fabricating the Same
Method of Fabricating Self-Aligned Bipolar Transistor
Cmos Image Sensor and Method for Fabricating the Same
Semiconductor Devices and Manufacturing Methods Thereof
Method of Manufacturing Mos Transistor
Method for Fabricating Semiconductor Device
Method for Forming Gate Oxide Layer in Semiconductor Device
Method for Forming Metal Pattern to Reduce Contact Resistivity with Interconnection Contact
Non-Volatile Memory Device and Drive Method Thereof
Method of Forming a Shallow Trench Isolation Structure in a Semiconductor Device
Erase Method in Flash Memory Device
Method for Isolating Semiconductor Devices
Method for Manufacturing Semiconductor Device
Method for Forming Dual Damascene Interconnection in Semiconductor Device
Method of Fabricating Interconnection Structure of Semiconductor Device
Methods of Fabricating Transistors in Semiconductor Devices
Patent:
7,153,732 →
Application:
11/024,994 →
Methods of Forming Wells in Semiconductor Devices
Semiconductor Device and Fabricating Method Thereof
Method for Fabricating a Cmos Image Sensor
Methods of Fabricating Lateral Double-Diffused Metal Oxide Semiconductor Devices
Shallow Trench Isolation Structure and Formation Method Thereof
Semiconductor Device and Fabricating Method Thereof
Sram Devices and Methods of Fabricating the Same
Transistors of Semiconductor Devices and Methods of Fabricating the Same
Method of Fabricating Semiconductor Device
Mono Gate Memory Device and Fabricating Method Thereof
Semiconductor Devices and Methods of Manufacturing the Same
Gate Electrodes of Semiconductor Devices and Methods of Manufacturing the Same
Method for Manufacturing Cmos Image Sensor
Method of Fabricating Capacitor in Semiconductor Device and Semiconductor Device Using the Same
Semiconductor Devices and Methods of Manufacturing the Same
Methods for Manufacturing Shallow Trench Isolation Layers of Semiconductor Devices
Method for Manufacturing a Non-Volatile Memory Device
Method for Manufacturing a Semiconductor Device
Cmos Image Sensor and a Method for Fabricating the Same
Cmos Image Sensor and Method for Fabricating the Same
Methods for Forming a P-Type Polysilicon Layer in a Semiconductor Device
Semiconductor Device and Manufacturing Method Thereof
Semiconductor Device and Method for Manufacturing the Same
Method for Fabricating Vertical Cmos Image Sensor
Method of Fabricating a Semiconductor Device
Manufacturing Method of Semiconductor Device
Flash Memory Cell and Method for Manufacturing the Same
Method for Forming an Intermetal Dielectric Layer Using Low-K Dielectric Material and a Semiconductor Device Manufactured Thereby
Cmos Image Sensor and Method of Fabricating the Same
Vertical-Type Capacitor Structure
Cmos Image Sensor
Method for Fabricating Cmos Image Sensor
Method of Fabricating Mos Transistor
Method of Fabricating Cmos Image Sensor
Cmos Image Sensor and Method for Fabricating the Same
Method of Fabricating Fin Field-Effect Transistors
Ldmos Transistor
Image Sensor Having Inner Lens
Microlens of Cmos Image Sensor and Method of Manufacturing the Same
Image Sensor and Method for Fabricating the Same
A Method of Fabricating a Mask Rom
Method of Forming Double Gate Dielectric Layers and Semiconductor Device Having the Same
Capacitor of Semiconductor Device and Manufacturing Method Thereof
Cmos Image Sensor
A Flash Memory Device and a Method of Manufacturing the Same
Method of Forming Pad and Fuse in Semiconductor Device
Method for Manufacturing a Semiconductor Device
Method of Forming a Stable Transistor by Dual Source/Drain Implantation
Metal Oxide Semiconductor Field Effect Transistor and Method of Fabricating the Same
Method of Forming a Gate of a Flash Memory Device
Cmos Image Sensor and Method for Fabricating the Same
Semiconductor Device and Method for Manufacturing the Same Including Two Antireflective Coating Films
Mos Transistor and Manufacturing Method Thereof
Nonvolatile Memory Device and Method for Fabricating the Same
Method for Manufacturing Semiconductor Device
Fabricating Method of Semiconductor Device
Method for Fabricating a Semiconductor Device
Method of Manufacturing a Semiconductor Device
Method of Fabricating Cmos Image Sensor
Method of Manufacturing a Semiconductor Device
Image Sensor and Method for Manufacturing the Same
Cmos Image Sensors
Cmos Image Sensor and Method for Manufacturing the Same
Method for Fabricating Cmos Image Sensor
Method for Fabricating Cmos Image Sensor
Method for Manufacturing Cmos Image Sensor
Cmos Image Sensor and Manufacturing Method Thereof
Semiconductor Device and Method of Fabricating the Same
Method for Forming a Gate Dielectric of a Semiconductor Device
Esd Protecting Circuit and Manufacturing Method Thereof
Semiconductor Device Using Epi-Layer and Method of Forming the Same
Method for Fabricating Al Metal Line
Cmos Image Sensor and Method for Fabricating the Same
Semiconductor Device and Method of Fabricating Thereof Capable of Reducing a Shallow Trench Isolation Stress Influence by Utilizing Layout Pattern Designs
Cmos Image Sensor and Method for Manufacturing the Same
Ldmos Device and Method for Manufacturing the Same
Method for Manufacturing a Cmos Image Sensor
Semiconductor Device and Method for Manufacturing the Same
Method of Manufacturing Isolation Layer Pattern in a Semiconductor Device and Isolation Layer Pattern Using the Same
Cmos Image Sensor and Method of Manufacturing the Same
Capacitor of Semiconductor Device and Method of Fabricating the Same
Method for Manufacturing Semiconductor Device
Method of Fabricating a Fin Field Effect Transistor in a Semiconductor Device
Cmos Image Sensor
Capacitor in Semiconductor Device and Method of Manufacturing the Same
Cmos Image Sensor
Method for Manufacturing Cmos Image Sensor
Method for Fabricating Cmos Image Sensor
Cmos Image Sensor
Cmos Image Sensor and Manufacturing Method Thereof
Method for Manufacturing Flash Memory Cell by Rie Slope Etching Reflowed Photoresist Pattern
Method of Manufacturing Image Sensor
Cmos Image Sensor and Method for Manufacturing the Same
Method of Making a Bipolar Junction Transistor
Method of Manufacturing a Transistor of a Semiconductor Device
Method for Fabricating a Transistor Using a Soi Wafer
Semiconductor Device and Method for Manufacturing the Same
Copper Metal Interconnection with a Local Barrier Metal Layer
Method of Manufacturing Cmos Image Sensor
Cmos Image Sensor
Method of Fabricating a Semiconductor Device
Semiconductor Device
Semiconductor Device with a Capacitor
Method of Fabricating Passivation
Method of Manufacturing Semiconductor Device
Method of Forming Compressive Channel Layer of Pmos Device Using Gate Spacer and Pmos Device Having a Compressed Channel Layer
High Voltage Semiconductor Device and Method for Fabricating the Same
Flash Memory Device and Method of Manufacturing the Same
Semiconductor Device and Method for Manufacturing the Same
Semiconductor Device and Method of Manufacturing the Same
Method for Fabricating Fully Silicided Gate
Method for Manufacturing Semiconductor Device
Mim Capacitor Manufacturing Method
Semiconductor Device and Method for Manufacturing the Same
Method for Manufacturing Bipolar Transistor
Capacitor and Manufacturing Method Thereof
Semiconductor Device and Method for Fabricating the Same
Method of Manufacturing High-Voltage Semiconductor Device and Low-Voltage Semiconductor Device
Nor-Type Flash Memory Cell Array and Method for Manufacturing the Same
I/O Cell Capable of Finely Controlling Drive Strength
Method of Fabricating Complementary Metal Oxide Silicon Image Sensor
Gate Structure in a Trench Region of a Semiconductor Device and Method for Manufacturing the Same
Method for Manufacturing Semiconductor Device
Static Random Access Memory and Method for Manufacturing the Same
Method for Fabricating Semiconductor Device
Semiconductor Device and Method for Manufacturing the Same
Method for Manufacturing Bipolar Transistor
Cmos Image Sensor and Method for Fabricating the Same
Capacitor Structure and Fabricating Method Thereof
Nonvolatile Memory Device and Method for Fabricating the Same
Mos Transistor and Manufacturing Method Thereof
Cmos Image Sensor and Method of Fabricating the Same
Gate Structure in a Trench Region of a Semiconductor Device and Method for Manufacturing the Same
Cmos Image Sensor and Manufacturing Method Thereof
Mim Capacitor and Metal Inetrconnection
Capacitor of Semiconductor Device and Method of Fabricating the Same
Ldmos Device and Method for Manufacturing the Same
Esd Protecting Circuit and Manufacturing Method Thereof
Semiconductor Device and Fabricating Method Thereof
Related Assignments
(4)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name
Nov 28, 2017
From: DONGBUANAM SEMICONDUCTOR INC.
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 044526/0571 →
Change of Name
Nov 30, 2017
From: DONGBU HITEK CO., LTD.
To: DB HITEK CO., LTD
Reel/Frame 044555/0913 →
Assignment of Assignor's Interest
Jul 10, 2019
From: DB HITEK CO., LTD.
To: COLUMBA TECHNOLOGIES INC.
Reel/Frame 049709/0857 →
Assignment of Assignor's Interest
Jun 5, 2020
From: COLUMBA TECHNOLOGIES, INC.
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 052845/0474 →