Method for manufacturing a CMOS image sensor
View Patent ↗Provided is a CMOS image sensor and method of manufacturing same. The CMOS image sensor includes a photodiode, a transfer transistor, a reset transistor, a drive transistor, and a select transistor. A device isolation layer is formed on a first conductive type substrate. Gate electrodes of the transfer transistor, the reset transistor, the drive transistor, and the select transistor are formed on an active region of the substrate with gate insulating layers interposed therebetween. A first diffusion region is formed of a second conductive type in a first region of the active region, where the first region does not include a floating diffusion region between the transfer transistor and the reset transistor and the photodiode region. A second diffusion region is formed of the second conductive type in the floating diffusion region at a concentration lower than that of the second conductive type first diffusion region.
1. A method for manufacturing a CMOS image sensor having a photodiode, a transfer transistor, a reset transistor, a drive transistor and a select transistor, the method comprising:
forming a device isolation layer on a device isolation region of a first conductive type substrate in which an active region and the device isolation region are defined;
forming gate electrodes for the transfer transistor, the reset transistor, the drive transistor and the select transistor on the active region with gate insulating layers interposed therebetween;
forming a first diffusion region of a second conductive type in a first region of the active region; and
forming a second diffusion region in a floating diffusion region between the transfer transistor and the reset transistor by implanting impurity ions only into the floating diffusion region at a concentration lower than that of the first diffusion region,
wherein the first diffusion region of the second conductive type is not formed in the floating diffusion region and a photodiode region.
2. The method according to claim 1 , wherein the first diffusion region is formed in the active region at one side of the gale electrode of the reset transistor and at both sides of the gate electrode of the drive transistor and the select transistor.
3. The method according to claim 2 , wherein the second diffusion region is formed in the active region at the other side of the gate electrode of the reset transistor at a concentration lower than that of the first diffusion region.
4. The method according to claim 1 , wherein the first diffusion region is formed at a concentration range of 1E20/cm 3 to 1E22/cm 3 .
5. The method according to claim 1 , wherein the second diffusion region is formed at a concentration range of 1E18/cm 3 to 1E20/cm 3 .
6. A method for manufacturing a CMOS image sensor having a photodiode, a reset transistor, a drive transistor and a select transistor, the method comprising:
forming a device isolation layer on a device isolation region of a first conductive type substrate in which an active region and the device isolation region are defined;
forming gate electrodes for the reset transistor, the drive transistor and the select transistor on the active region with gate insulating layers interposed therebetween;
forming a first diffusion region in a first region of the active region; and
forming a second diffusion region in a second region of the active region between the reset transistor and the photodiode by implanting impurity ions only into the second region at a concentration lower than that of the first diffusion region,
wherein the first diffusion region is not formed in the second region.
7. The method according to claim 6 , wherein the first diffusion region is formed in the active region at one side of the gate electrode of the reset transistor and at both sides of the gate electrode of the drive transistor and the select transistor.
8. The method according to claim 7 , wherein the second diffusion region is formed in the active region at the other side of the gate electrode of the reset transistor at a concentration lower than that of the first diffusion region.
9. The method according to claim 6 , wherein the first diffusion region is formed at a concentration range of 1E20/cm 3 to 1E22/cm 3 .
10. The method according to claim 6 , wherein the second diffusion region is formed at a concentration range of 1E18/cm 3 to 1E20/cm 3 .