IP Library Granted Patent US 7,683,448
Granted Patent B2
US 7,683,448 · App. 11/612,627 · Granted Mar 23, 2010

CMOS image sensor

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Quick Facts
Patent No.
US 7,683,448
App. No.
11/612,627
Granted
Mar 23, 2010
Kind
B2
Abstract

A complementary metal oxide semiconductor (CMOS) image sensor is provided. The CMOS image sensor can include a photodiode, a transfer transistor (Tx), a reset transistor (Rx), a drive transistor (Dx), and a select transistor (Sx). The CMOS image sensor includes a floating diffusion region between the transfer transistor (Tx) and the reset transistor (Rx). The gate of the drive transistor (Dx) is formed of polysilicon and extends to and is formed on the floating diffusion region.

Claims (8)

1. A CMOS image sensor, comprising:

a photodiode;

a transfer transistor;

a reset transistor;

a drive transistor having a polysilicon gate; and

a select transistor,

wherein a floating diffusion region is formed between the transfer transistor and the reset transistor, and wherein a portion of the polysilicon gate of the drive transistor extends to and is formed on the floating diffusion region, and

wherein an area of the polysilicon gate formed on the floating diffusion region ranges from ½ to ⅘ of an area of the floating diffusion region.

Assignments (2)
CHANGE OF NAME Recorded Nov 30, 2017
From: DONGBU HITEK CO., LTD.
To: DB HITEK CO., LTD
Reel/Frame 044555/0913 →
MERGER AND CHANGE OF NAME Recorded Nov 29, 2017
From: DONGBU ELECTRONICS CO., LTD.; DONGBU HITEK CO., LTD.
To: DONGBU HITEK CO., LTD.
Reel/Frame 044533/0523 →