Patent Assignment
Reel/Frame 049709/0857
Assignment of Assignor's Interest
Recorded: 2019-07-10
Pages: 14
Assignor
DB HITEK CO., LTD.
Executed: 2019-01-25
Assignee
COLUMBA TECHNOLOGIES INC.
303 TERRY FOX DRIVE, SUITE 300, OTTAWA, K2K 3J1, CANADA
Covered Properties
(144)
Method for Forming an Mim Capacitor
Methods of Manufacturing Semiconductor Devices
Methods to Fabricate Semiconductor Devices
Methods for Fabricating a Semiconductor Device
Method of Manufacturing a Cmos Image Sensor
Methods of Manufacturing and-Type Flash Memory Devices
Methods for Forming a Device Isolating Barrier and Methods for Forming a Gate Electrode Using the Same
Methods for Fabricating Semiconductor Devices
Semiconductor Devices Having Diffusion Barrier Regions and Halo Implant Regions and Methods of Fabricating the Same
Cmos Image Sensor and Manufacturing Method Thereof
Methods for Fabricating an Interlayer Dielectric Layer of a Semiconductor Device
Semiconductor Devices and Methods of Fabricating the Same
Cmos Image Sensor and Method for Fabricating the Same
Semiconductor Device and Manufacturing Method Thereof
Methods of Forming Halo Regions in Nmos Transistors
Method for Fabricating Semiconductor Device
Image Sensor and Method for Fabricating the Same
Semiconductor Devices and Manufacturing Methods Thereof
Method for Fabricating Semiconductor Device
Method for Forming Gate Oxide Layer in Semiconductor Device
Method of Forming a Shallow Trench Isolation Structure in a Semiconductor Device
Method for Isolating Semiconductor Devices
Method for Forming Dual Damascene Interconnection in Semiconductor Device
Methods of Forming Wells in Semiconductor Devices
Shallow Trench Isolation Structure and Formation Method Thereof
Semiconductor Device and Fabricating Method Thereof
Sram Devices and Methods of Fabricating the Same
Transistors of Semiconductor Devices and Methods of Fabricating the Same
Method of Fabricating Semiconductor Device
Mono Gate Memory Device and Fabricating Method Thereof
Semiconductor Devices and Methods of Manufacturing the Same
Gate Electrodes of Semiconductor Devices and Methods of Manufacturing the Same
Method of Fabricating Capacitor in Semiconductor Device and Semiconductor Device Using the Same
Semiconductor Devices and Methods of Manufacturing the Same
Methods for Manufacturing Shallow Trench Isolation Layers of Semiconductor Devices
Method for Manufacturing a Non-Volatile Memory Device
Method for Manufacturing a Semiconductor Device
Cmos Image Sensor and a Method for Fabricating the Same
Cmos Image Sensor and Method for Fabricating the Same
Methods for Forming a P-Type Polysilicon Layer in a Semiconductor Device
Semiconductor Device and Manufacturing Method Thereof
Semiconductor Device and Method for Manufacturing the Same
Method of Fabricating a Semiconductor Device
Vertical-Type Capacitor Structure
Method of Fabricating Mos Transistor
Method of Fabricating Cmos Image Sensor
Ldmos Transistor
Method of Forming Double Gate Dielectric Layers and Semiconductor Device Having the Same
Capacitor of Semiconductor Device and Manufacturing Method Thereof
Method for Manufacturing a Semiconductor Device
Method of Forming a Stable Transistor by Dual Source/Drain Implantation
Metal Oxide Semiconductor Field Effect Transistor and Method of Fabricating the Same
Semiconductor Device and Method for Manufacturing the Same Including Two Antireflective Coating Films
Method for Manufacturing Semiconductor Device
Fabricating Method of Semiconductor Device
Method for Fabricating a Semiconductor Device
Method of Manufacturing a Semiconductor Device
Cmos Image Sensors
Method for Forming a Gate Dielectric of a Semiconductor Device
Semiconductor Device Using Epi-Layer and Method of Forming the Same
Method for Fabricating Al Metal Line
Cmos Image Sensor and Method for Fabricating the Same
Semiconductor Device and Method for Manufacturing the Same
Method of Manufacturing Isolation Layer Pattern in a Semiconductor Device and Isolation Layer Pattern Using the Same
Method for Manufacturing Semiconductor Device
Cmos Image Sensor
Semiconductor Device and Method for Manufacturing the Same
Copper Metal Interconnection with a Local Barrier Metal Layer
Method of Fabricating a Semiconductor Device
Semiconductor Device
Semiconductor Device and Method of Manufacturing the Same
Method for Fabricating Fully Silicided Gate
Mim Capacitor Manufacturing Method
Semiconductor Device and Method for Manufacturing the Same
Semiconductor Device and Method for Fabricating the Same
Method of Manufacturing High-Voltage Semiconductor Device and Low-Voltage Semiconductor Device
Gate Structure in a Trench Region of a Semiconductor Device and Method for Manufacturing the Same
Method for Manufacturing Semiconductor Device
Static Random Access Memory and Method for Manufacturing the Same
Method of Forming Dual Damascene Pattern
Method for Fabricating Semiconductor Device
Bipolar Junction Transistor and Cmos Image Sensor Having the Same
Method for Forming Contacts of Semiconductor Device
Semiconductor Device and Method for Manufacturing the Device
Method of Forming Semiconductor Device
Semiconductor Device and Method for Manufacturing the Same
Method of Forming a Device Isolation Film of a Semiconductor Device
Image Sensor and Method of Fabricating the Same
Lateral Mos Transistor and Method for Manufacturing Thereof
Method for Manufacturing a Semiconductor Capacitor
Ion Implantation Method for High Voltage Device
Semiconductor Device and Method for Manufacturing the Same
Semiconductor Device and Fabricating Method Thereof
Cmos Image Sensor and Method for Fabricating the Same
Semiconductor Device and Method for Fabricating the Same
Method for Forming Fine Pattern of Semiconductor Device
Method for Forming Semiconductor Fine-Pitch Pattern
Method of Fabricating Non-Volatile Memory Device with Concavely Depressed Electron Injection Region
Method for Manufacturing Metal-Insulator-Metal Capacitor
Method of Fabricating Semiconductor High-Voltage Device Comprising the Steps of Using Photolithogrpahic Processes to Form Nitride Spacer Regions and Dry Etch Process to Form Deep Trench Regions
Method of Manufacturing Flash Memory Device with Reduced Void Generation
Method of Manufacturing Flash Memory Device
Capacitor Structure and Fabricating Method Thereof
Structure of Mtcmos Cell
Method for Forming Interlayer Insulating Film in Semiconductor Device
Semiconductor Device and Method for Manufacturing the Same
High Voltage Semiconductor Device and Method for Manufacturing the Same
Method for Manufacturing Semiconductor Device Including Implanting Through a Hole Patterned from a First Photoresist an Oxide and a Second Photoresist
Method for Fabricating Semiconductor Device
Interconnect Structure and Method of Manufacturing the Same
Method for Manufacturing a Recessed Gate Transistor
Gate Structure in a Trench Region of a Semiconductor Device and Method for Manufacturing the Same
Lateral Double Diffused Metal Oxide Semiconductor (Ldmos) Device and Method of Manufacturing Ldmos Device
Semiconductor Device and Method of Manufacturing the Same
Image Sensor Inhibiting Electrical Shorts in a Contract Plug Penetrating an Image Sensing Device and Method for Manufacturing the Same
Power Semiconductor Device and Method of Manufacturing the Same
Semiconductor Device and Fabricating Method Thereof
Ldmos Transistor and Method for Manufacturing the Same
Semiconductor Device of Common Source Structure and Manufacturing Method of Semiconductor Device of Common Source Structure
Semiconductor Device and Fabricating Method Thereof
One Time Programmable Memory Device and Manufacturing Method of One Time Programmable Memory Device
Flash Memory Device with a Plurality of Source Plates
Semiconductor Device and Manufacturing Method of Semiconductor Device
Semiconductor Device and Method for Manufacturing the Same
Method for Fabricating Metal Interconnection of Semiconductor Device
Flash Memory Device and Method of Manufacturing the Same
Semiconductor Device and Method for Fabricating the Same
Lateral Double Diffused Metal Oxide Semiconductor
Method for Fabricating Flash Memory Device
Method for Fabricating Lateral Double Diffused Metal Oxide Semiconductor (Ldmos) Transistor
Semiconductor Device and Method of Manufacturing the Same
Capacitor for Semiconductor Device and Manufacturing Method of Capacitor for Semiconductor Device
Flash Memory Device and Method for Manufacturing Flash Memory Device
Semiconductor Memory Device, Method of Manufacturing the Same, and Cell Array of Semiconductor Memory Device
Passive Type Image Sensor and Method Including First and Second Anti-Blooming Transistors Discharging Electric Charges While Integrating Electric Charges.
Power Management Integrated Circuit
Lateral Double Diffused Metal Oxide Semiconductor Device and Method of Manufacturing the Same
Semiconductor Device and Method for Fabricating the Same
Single Poly Eeprom Having a Tunnel Oxide Layer
Image Sensor and Method for Fabricating the Same
Semiconductor Device and Method for Manufacturing the Same
Semiconductor Device and Method for Manufacturing the Same
Bootstrap Field Effect Transistor (Fet)
Semiconductor Package and Method of Forming Semiconductor Package
Related Assignments
(3)
Other recorded transfers of the patents in this record — the chain of ownership.
Merger and Change of Name
Nov 29, 2017
From: DONGBU ELECTRONICS CO., LTD.; DONGBU HITEK CO., LTD.
To: DONGBU HITEK CO., LTD.
Reel/Frame 044533/0523 →
Change of Name
Nov 30, 2017
From: DONGBU HITEK CO., LTD.
To: DB HITEK CO., LTD
Reel/Frame 044555/0913 →
Assignment of Assignor's Interest
Jun 5, 2020
From: COLUMBA TECHNOLOGIES, INC.
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 052845/0474 →