Power management integrated circuit
View Patent ↗A Power Management Integrated Circuit (PMIC) that includes a substrate, a high-side (HS) region on the substrate, a low-side (LS) region spaced from the first region, a device isolation layer interposed between the HS region and the LS region, a metal interconnection connected to the HS region across the device isolation layer and configured to permit a high-voltage current to flow in the HS region, and at least one electric field shield between the metal interconnection and the device isolation layer. Since the electric field shield is disposed under the metal interconnection, a sufficient breakdown voltage can be ensured for the HS region and the LS region.
1. A Power Management Integrated Circuit (PMIC) comprising:
a substrate;
a High-Side (HS) region on the substrate;
a Low-Side (LS) region spaced from the HS region;
a device isolation layer interposed between the HS region and the LS region;
a metal interconnection connected to the HS region across the device isolation layer and configured to permit a high-voltage current to flow in the HS region; and
at least one electric field shield between the metal interconnection and the device isolation layer;
a vertical part disposed on a bottom side of the electric field shield; and
a horizontal part extending from the vertical art to the HS region,
wherein the horizontal part extends to cover the device isolation layer,
wherein the horizontal part extends to cover a portion of the HS region.
2. The PMIC of claim 1 , wherein the electric field shield is connected to the LS region.
3. The PMIC of claim 1 , wherein the electric field shield is disposed at a position corresponding to the metal interconnection.
4. The PMIC of claim 1 , wherein the electric field shield extends to cover a portion of the HS region.
5. The PMIC of claim 1 , wherein the electric field shield comprises a metal.
6. The PMIC of claim 1 , wherein a distance between the metal interconnection and the electric field shield is one of equal to and less than half a distance between the metal interconnection and the device isolation layer.
7. The PMIC of claim 1 , wherein the at least one electric field shield comprises a plurality of electric field shields that are vertically spaced from each other.
8. The PMIC of claim 7 , further comprising a connection part connecting the plurality of electric field shields.
9. The PMIC of claim 1 , wherein the LS region spaced from the HS region by the device isolation layer.
10. An apparatus comprising:
a substrate having a High-Side (HS) region and a Low-Side (LS) region defined by a device isolation layer;
an HS device in the HS region;
an LS device in the LS region;
a metal interconnection directly on a portion of the HS device and configured to extend across the uppermost surface of the device isolation layer;
an electric field shield under the metal interconnection, the electric field shield comprising a first electric field shield portion, a second electric field portion shield spatially spaced vertically from the first electric field shield portion, and a third electric field shield portion configured to connect the first electric field shield portion to the second electric field shield portion.
11. The apparatus of claim 10 , wherein respective first ends of the first electric shield portion and the second electric field shield portion are connected through the third electric field shield portion.
12. The apparatus of claim 10 , wherein respective second ends of the first electric shield portion and the second electric field shield portion are connected to and extend from the LS device.
13. The apparatus of claim 10 , wherein the apparatus comprises a Power Management Integrated Circuit.
14. An integrated circuit comprising:
a substrate;
a High-Side (HS) region having an HS device therein;
a Low-Side (LS) region spaced from the HS region and having an LS device therein;
a device isolation layer interposed between the HS region and the LS region;
a metal interconnection directly on the uppermost surface of the HS device;
an electric field shield disposed under the metal interconnection and extending across the entire device isolation layer and a portion of the HS region and a portion of the LS region,
wherein the electric field shield includes a first electric field shield portion connected at a first end thereof to the LS device, a second electric field shield portion spatially spaced vertically from and extending in parallel to the first electric field shield portion, and a third electric field shield connection portion connected between a first end of the second electric field shield portion and the first electric field shield portion.
15. The integrated circuit of claim 14 , wherein the second electric field shield portion extends to cover the device isolation layer and a portion of the HS region.
16. The integrated circuit of claim 14 , wherein the integrated circuit comprises a Power Management Integrated Circuit.