Semiconductor memory device, method of manufacturing the same, and cell array of semiconductor memory device

1. A semiconductor memory device comprising:

a first gate insulation layer and a second gate insulation layer, being spaced a predetermined distance from each other, on a portion of a semiconductor substrate;

a select gate on the first gate insulation layer;

a floating gate on the second gate insulation layer;

a third gate insulation layer on the floating gate;

a control gate on the third gate insulation layer;

a first ion implantation region in the semiconductor substrate between the select gate and the floating gate;

a second ion implantation region in the semiconductor substrate at a side of the select gate opposite the first ion implantation region; and

a third ion implantation region in the semiconductor substrate at a side of the floating gate opposite the first ion implantation region;

wherein the semiconductor memory device is configured such that during an operation of a program state for a selected unit cell,

a first voltage of positive potential is applied to the control gate,

the select gate is connected to a reference voltage,

a first voltage of negative potential is applied to the third ion implantation region, and

the second ion implantation region is connected to the reference voltage or is floated.

2. The semiconductor memory device according to claim 1 , wherein the semiconductor substrate comprises a second conductive type well or a second conductive type sub substrate; and

wherein the first ion implantation region, the second ion implantation region, and the third ion implantation region are regions implanted with a first conductive type ion.

3. The semiconductor memory device according to claim 1 , wherein the third gate insulation layer comprises an Oxide-Nitride-Oxide (ONO) layer structure.

4. The semiconductor memory device according to claim 2 , wherein the first conductive type ion is a P-type impurity ion.

5. The semiconductor memory device according to claim 1 , wherein the second ion implantation region serves as a source region of the select gate and the third ion implantation region serves as a drain region of the floating gate.

6. The semiconductor memory device according to claim 1 , wherein an ion doping concentration of the first ion implantation region is lower than an ion doping concentration of the second ion implantation region and the third ion implantation region.

7. The semiconductor memory device according to claim 1 , wherein during the operation of the program state, an inhibition operation condition is applied to an unselected unit cell.

8. The semiconductor memory device according to claim 7 , wherein the inhibition operation condition comprises applying a negative voltage to an unselected control gate of the unselected unit cell.

9. The semiconductor memory device according to claim 5 , wherein the semiconductor memory device is configured such that during an operation of an erase state,

a first voltage of negative potential is applied to the control gate;

a second voltage of positive potential is applied to the select gate;

the third ion implantation region is floating; and

the second ion implantation region is connected to a reference voltage.