CMOS image sensor and method for fabricating the same

1. A CMOS image sensor, comprising:

a plurality of photodiodes formed at fixed intervals on a surface of a semiconductor substrate;

a light-shielding layer formed on portions of the semiconductor substrate exposed between the photodiodes for allowing a light signal reception at each photodiode only by blocking any light arriving between the photodiodes;

an insulating interlayer formed on the surface of the semiconductor substrate including the light-shielding layer;

a color filter layer having a plurality of color filters separated by a predetermined gap formed on the insulating interlayer; and

an additional structural layer having a pattern for blocking light incident to said color filter layer at the predetermined gap on the insulating interlayer, wherein a pattern of said additional structural layer is partially overlapped by the color filters.

2. The CMOS image sensor of claim 1 , wherein said additional structural layer is formed of black photoresist patterned according to the predetermined gap of said color filter layer.

3. The CMOS image sensor of claim 1 , wherein said color filter layer is formed by successive applications of a colored resist for filtering light by wavelength, each colored resist being coated on the structure provided under said color filter layer and being separately patterned to overlap adjacent portions of said additional structural layer.

4. The CMOS image sensor of claim 1 , wherein the insulating interlayer is formed as a multi-layered structure.

5. The CMOS image sensor of claim 1 ,

wherein said light-shielding layer is selectively patterned by photolithography leaving opaque metal on portions of the semiconductor substrate exposed between the photodiodes.

6. The CMOS image sensor of claim 5 , wherein said light-shielding layer has a pattern corresponding to an arrangement of the photodiodes.

7. The CMOS image sensor of claim 1 , wherein the pattern of said additional structural layer has a width greater than the predetermined gap.

8. The CMOS image sensor of claim 1 , wherein said additional structural layer is arranged between the color filters of said color filter layer.

9. The CMOS image sensor of claim 1 , further comprising:

a planarization layer formed on said color filter layer and disposed between the color filters of said color filter layer and atop a portion of said additional structural layer.

10. The CMOS image sensor of claim 1 , further comprising:

a plurality of microlenses respectively disposed above the color filters of said color filter layer.

11. The CMOS image sensor, comprising:

a semiconductor substrate;

a plurality of photodiodes arranged at fixed intervals in said semiconductor substrate;

a light-shielding layer formed on portions of the semiconductor substrate exposed between the photodiodes and partially overlapping said plurality of photodiodes;

an insulating interlayer formed on an entire surface of said semiconductor substrate including said plurality of photodiodes;

a color filter layer, formed on said insulating interlayer, having a plurality of color filters separated by a predetermined gap;

a planarization layer formed on the entire surface of said semiconductor substrate including said color filter layer;

a plurality of microlenses formed on said planarization layer in correspondence with the color filters of said color filter layer; and

an additional structural layer disposed between said color filter layer and said insulating interlayer, wherein the additional structural layer is provided to close the predetermined gap between the color filters of said color filter layer and partially overlapped by the color filters.