Method for fabricating CMOS image sensor
Form a gate electrode on a transistor region of a first conductivity type semiconductor substrate including a photodiode region and the transistor region. Form lightly-doped second conductivity type diffusion areas at both sides of the gate electrode in the photodiode region and the transistor region. Form a screen layer over an entire surface of the semiconductor substrate including the gate electrode. Form a highly-doped second conductivity type diffusion area by planting second conductivity type impurity ions with high density to the entire surface of the semiconductor substrate using the photoresist pattern as a mask, and remove the photoresist pattern and the oxide layer.
1 . A method for fabricating a CMOS image sensor comprising:
forming a gate electrode on a transistor region of a first conductivity type semiconductor substrate including a photodiode region and the transistor region;
respectively forming lightly-doped second conductivity type diffusion areas at both sides of the gate electrode in the photodiode region and the transistor region;
forming a screen layer over an entire surface of the semiconductor substrate including the gate electrode;
forming a photoresist pattern to cover the photodiode region and the gate electrode;
forming a highly-doped second conductivity type diffusion area by implanting second conductivity type impurity ions with high density into the entire surface of the semiconductor substrate using the photoresist pattern as a mask; and
removing the photoresist pattern and the oxide layer.
2 . The method of claim 1 , wherein the screen layer is formed of a TEOS-based oxide material.
3 . The method of claim 1 , wherein the screen layer comprises an amorphous layer.
4 . The method of claim 1 , wherein the lightly-doped second conductivity type diffusion area of the photodiode region is deeper than the lightly-doped second conductivity type diffusion area of the transistor region.
5 . The method of claim 1 , wherein the screen layer is formed at a thickness between 70 Å and 130 Å.
6 . The method of claim 1 , wherein the screen layer is removed by a wet-etching method.
7 . The method of claim 1 , wherein the highly-doped second conductivity type diffusion area is formed by implanting the second conductivity type impurity ions at energy of about 80 KeV.
8 . The method of claim 1 , further comprising:
forming an epitaxial layer by implanting first conductivity type impurity ions into the surface of the first conductivity type semiconductor substrate, wherein the density of first conductivity type impurity ions is relatively lower than the density of first conductivity type semiconductor substrate.
9 . The method of claim 1 , further comprising:
forming a silicide layer on the gate electrode of the transistor region and on an upper surface of the highly-doped second conductivity type diffusion area.