Patent Assignment
Reel/Frame 017598/0607
Assignment of Assignor's Interest
Recorded: 2006-02-21
Pages: 3
Assignor
HAN, JAE WON
Executed: 2005-12-27
Assignee
DONGBUANAM SEMICONDUCTOR, INC.
891-10 DAECHI-DONG, KANGNAM-KU, SEOUL, KOREA, REPUBLIC OF
Covered Property
(1)
Sputtering Apparatus and Method for Forming Metal Silicide Layer Using the Same
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.