IP Library › Assignment 017683/0036
Patent Assignment
Reel/Frame 017683/0036

Assignment of Assignor's Interest

Recorded: 2006-03-10 Pages: 3
Assignor
HATAKEYAMA, JUN
Executed: 2006-01-24
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Photoresist Undercoat-Forming Material and Patterning Process
Patent: 7,358,025 →
Application: 11/372,370 →
Publication: US 2006/0204891