IP Library › Assignment 017788/0851
Patent Assignment
Reel/Frame 017788/0851

Assignment of Assignor's Interest

Recorded: 2006-04-17 Pages: 3
Assignors
MURAKI, MASATO
Executed: 2006-04-04
OHTA, HIROYA
Executed: 2006-04-10
Assignees
CANON KABUSHIKI KAISHA
3-30-2, SHIMOMARUKO, OHTA-KU, TOKYO, JAPAN
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Aberration Adjusting Method, Device Fabrication Method, and Charged Particle Beam Lithography Machine
Patent: 7,230,252 →
Application: 11/337,444 →
Publication: US 2006/0169927
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →