IP Library Assignment 017798/0250
Patent Assignment
Reel/Frame 017798/0250

Assignment of Assignor's Interest

Recorded: 2006-06-15 Pages: 3
Assignor
KIM, SI-YOUN
Executed: 2006-05-24
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Method of Forming a Semiconductor Device Having an Etch Stop Layer and Related Device
Patent: 7,572,721 →
Application: 11/424,518 →
Publication: US 2007/0155150