Patent Assignment
Reel/Frame 017904/0028
Assignment of Assignor's Interest
Recorded: 2006-05-16
Pages: 3
Assignors
SUNG, SHING-LI
Executed: 2006-05-15
LEE, WONSEOK
Executed: 2006-05-12
WANG, JUDY
Executed: 2006-05-12
MA, SHAWING
Executed: 2006-05-12
Assignee
APPLIED MATERIALS, INC.
P.O. BOX 450A, LEGAL AFFAIRS DEPT., M/S 2061-LEGAL, SANTA CLARA, CALIFORNIA, 95052
Covered Property
(1)
Dielectric Plasma Etch Process with in-Situ Amorphous Carbon Mask with Improved Critical Dimension and Etch Selectivity