IP Library Assignment 018068/0739
Patent Assignment
Reel/Frame 018068/0739

Assignment of Assignor's Interest

Recorded: 2005-11-28 Pages: 3
Assignors
KOYAMA, NAOYUKI
Executed: 2005-11-21
MACHII, YOUICHI
Executed: 2005-11-21
YOSHIDA, MASATO
Executed: 2005-11-21
FUKASAWA, MASATO
Executed: 2005-11-21
ASHIZAWA, TORANOSUKE
Executed: 2005-11-21
Assignee
HITACHI CHEMICAL CO., LTD.
1-1, NISHISHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0449, JAPAN
Covered Property (1)
Polishing Slurry and Polishing Method
Patent: 8,075,800 →
Application: 10/558,406 →
Publication: US 2006/0289826
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →