Patent Assignment
Reel/Frame 018571/0562
Assignment of Assignor's Interest
Recorded: 2006-11-08
Pages: 3
Assignors
OGIHARA, TSUTOMU
Executed: 2006-10-17
ASANO, TAKESHI
Executed: 2006-10-17
IWABUCHI, MOTOAKI
Executed: 2006-10-17
UEDA, TAKAFUMI
Executed: 2006-10-17
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Silicon-Containing Film Forming Composition, Silicon-Containing Film Serving as Etching Mask, Substrate Processing Intermediate, and Substrate Processing Method