Patent Assignment
Reel/Frame 018686/0086
Assignment of Assignor's Interest
Recorded: 2006-12-18
Pages: 3
Assignors
SUGIYAMA, YASUHIKO
Executed: 2006-11-10
TASHIRO, JUNICHI
Executed: 2006-11-10
YASAKA, ANTO
Executed: 2006-11-10
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMU-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Photomask Correction Method Using Composite Charged Particle Beam, and Device Used in the Correction Method
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.