Patent Assignment
Reel/Frame 018863/0554
Assignment of Assignor's Interest
Recorded: 2007-01-31
Pages: 3
Assignors
IVANOV, VLADIMIR VITALEVITCH
Executed: 2007-01-10
BANINE, VADIM YEVGENYEVICH
Executed: 2007-01-23
KOSHELEV, KONSTANTIN NIKOLAEVITCH
Executed: 2007-01-10
Assignee
ASML NETHERLANDS B.V.
DE RUN 6501, VELDHOVEN, NL-5504 DR., NETHERLANDS
Covered Property
(1)
Plasma Radiation Source, Method of Forming Plasma Radiation, Apparatus for Projecting a Pattern from a Patterning Device Onto a Substrate and Device Manufacturing Method