IP Library Assignment 018909/0457
Patent Assignment
Reel/Frame 018909/0457

Assignment of Assignor's Interest

Recorded: 2007-02-12 Pages: 2
Assignors
KAWAMURA, DAISUKE
Executed: 2006-11-28
SHIOBARA, EISHI
Executed: 2006-12-18
TAKEISHI, TOMOYUKI
Executed: 2006-12-12
HAYASAKI, KEI
Executed: 2006-11-28
ONISHI, YASUNOBU
Executed: 2006-11-28
ITO, SHINICHI
Executed: 2006-11-29
HIGASHIKI, TATSUHIKO
Executed: 2006-11-29
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO 105-8001, JAPAN
Covered Property (1)
Semiconductor Device Manufacturing Method to Form Resist Pattern.
Patent: 7,968,272 →
Application: 11/600,198 →
Publication: US 2007/0128554