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Patent Assignment

Reel/Frame 018954/0034

ASSIGNMENT OF ASSIGNOR'S INTEREST

Recorded: 2007-03-02 Received: 2007-03-02 Pages: 2

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Assignor

DOTSIKAS, IONNIS

Executed: 2003-10-21

Assignee

INFINEON TECHNOLOGIES AG

ST.-MARTIN-STRASSE 53, MUENCHEN, DEX, 81669, GERMANY

Covered Application (1)

METHOD AND FURNACE FOR THE VAPOR PHASE DEPOSITION OF COMPONENTS ONTO SEMICONDUCTOR SUBSTRATES WITH A VARIABLE MAIN FLOW DIRECTION OF THE PROCESS GAS

App. No. 10/675,049