IP Library Assignment 018988/0518
Patent Assignment
Reel/Frame 018988/0518

Assignment of Assignor's Interest

Recorded: 2007-03-09 Pages: 6
Assignors
AKATSU, TAKESHI
Executed: 2006-06-22
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A.
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, BERNIN, 38190, FRANCE
Covered Property (1)
Method of Fabricating a Release Substrate
Patent: 7,544,265 →
Application: 11/481,696 →
Publication: US 2007/0077729
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 4, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027800/0911 →