Patent Assignment
Reel/Frame 019052/0574
Assignment of Assignor's Interest
Recorded: 2007-03-22
Pages: 4
Assignors
TANG, XIANMIN
Executed: 2007-03-06
CHUNG, HUA
Executed: 2007-03-06
WANG, RONGJUN
Executed: 2007-03-07
GUNG, TZA-JING
Executed: 2007-03-06
GOPALRAJA, PRABURAM
Executed: 2007-03-08
YU, JICK
Executed: 2007-03-07
YANG, HONG
Executed: 2007-03-06
Assignee
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE, SANTA CLARA, CALIFORNIA, 95054
Covered Property
(1)
Sputtering Chamber Having Auxiliary Backside Magnet to Improve Etch Uniformity and Magnetron Producing Sustained Self Sputtering of Ruthenium and Tantalum