IP Library Assignment 019210/0251
Patent Assignment
Reel/Frame 019210/0251

Assignment of Assignor's Interest

Recorded: 2007-04-25 Pages: 2
Assignors
TANAKA, MAKI
Executed: 2007-02-20
SHISHIDO, CHIE
Executed: 2007-02-20
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI, 1-CHOME,, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Method for Measuring a Pattern Dimension Using a Scanning Electron Microscope
Patent: 7,732,761 →
Application: 11/673,057 →
Publication: US 2007/0187595
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →