Patent Assignment
Reel/Frame 019275/0826
Assignment of Assignor's Interest
Recorded: 2007-05-10
Pages: 3
Assignee
CANON KABUSHIKI KAISHA
3-30-2, SHIMOMARUKO, OHTA-KU, TOKYO, JAPAN
Covered Property
(1)
Photosensitive Compound, Photosensitive Composition, Method for Resist Pattern Formation, and Process for Device Production