Patent Assignment
Reel/Frame 019340/0406
Assignment of Assignor's Interest
Recorded: 2007-05-24
Pages: 3
Assignee
ADVANCED MASK INSPECTION TECHNOLOGY INC.
1 KOMUKAI TOSHIBA-CHO, SAIWAI-KU, KAWASAKI-SHI, KANAGAWA, 212-8583, JAPAN
Covered Property
(1)
Pattern defect inspection method and apparatus using image correction technique
Application:
11/386,744 →
Publication:
US 2006/0222233
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.