IP Library Assignment 019367/0218
Patent Assignment
Reel/Frame 019367/0218

Assignment of Assignor's Interest

Recorded: 2007-05-10 Pages: 3
Assignors
HATAKEYAMA, JUN
Executed: 2007-04-13
FUJII, TOSHIHIKO
Executed: 2007-04-13
WATANABE, TAKERU
Executed: 2007-04-13
KOBAYASHI, KATSUHIRO
Executed: 2007-04-13
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Photoresist Undercoat-Forming Material and Patterning Process
Patent: 7,632,624 →
Application: 11/798,105 →
Publication: US 2007/0275325