IP Library Assignment 019742/0158
Patent Assignment
Reel/Frame 019742/0158

Assignment of Assignor's Interest

Recorded: 2007-08-10 Pages: 3
Assignors
CAI, YONG
Executed: 2007-06-08
CHU, HUNG-SHEN
Executed: 2007-06-08
Assignee
HONG KONG APPLIED SCIENCE AND TECHNOLOGY RESEARCH INSTITUTE CO. LTD.
3/F, BUILDING 6, 2 SCIENCE PARK WEST AVENUE, HONG KONG SCIENCE PARK,, SHATIN, NEW TERRITORIES HONG KONG, CHINA
Covered Property (1)
Method of super flat chemical mechanical polishing technology and semiconductor elements produced thereof
Patent: 8,415,186 →
Application: 11/891,466 →
Publication: US 2008/0197367