IP Library Assignment 019925/0654
Patent Assignment
Reel/Frame 019925/0654

Assignment of Assignor's Interest

Recorded: 2007-10-05 Pages: 4
Assignors
FISCHER, DANIEL
Executed: 2007-03-30
SCHALLER, MATTHIAS
Executed: 2007-03-30
LEHR, MATTHIAS
Executed: 2007-03-30
DITTMAR, KORNELIA
Executed: 2007-03-30
Assignee
ADVANCED MICRO DEVICES, INC.
5204 EAST BEN WHITE BOULEVARD, AUSTIN, TEXAS, 78741
Covered Property (1)
High Yield Plasma Etch Process for Interlayer Dielectrics
Patent: 8,062,982 →
Application: 11/867,972 →
Publication: US 2008/0202685
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Feb 19, 2020
From: ADVANCED MICRO DEVICES, INC.
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
Reel/Frame 051861/0682 →