IP Library Assignment 020113/0893
Patent Assignment
Reel/Frame 020113/0893

Assignment of Assignor's Interest

Recorded: 2007-11-06 Pages: 3
Assignors
HASEBE, KAZUHIDE
Executed: 2007-09-28
ISHIDA, YOSHIHIRO
Executed: 2007-09-28
FUJITA, TAKEHIKO
Executed: 2007-09-22
OGAWA, JUN
Executed: 2007-09-25
NAKAJIMA, SHIGERU
Executed: 2007-09-28
Assignee
TOKYO ELECTRON LIMITED
3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO 107-8481, JAPAN
Covered Property (1)
Film Formation Method and Apparatus for Forming Silicon Oxide Film
Patent: 7,906,168 →
Application: 11/902,782 →
Publication: US 2008/0081104