Patent Assignment
Reel/Frame 020138/0045
Assignment of Assignor's Interest
Recorded: 2007-11-20
Pages: 5
Assignors
YAMAUCHI, TAKASHI
Executed: 2007-10-03
KINOSHITA, ATSUHIRO
Executed: 2007-10-09
TSUCHIYA, YOSHINORI
Executed: 2007-10-09
KOGA, JUNJI
Executed: 2007-10-23
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 105-8001, JAPAN
Covered Property
(1)
Method of Forming a Silicide Layer While Applying a Compressive or Tensile Strain to Impurity Layers