IP Library Assignment 020269/0217
Patent Assignment
Reel/Frame 020269/0217

Assignment of Assignor's Interest

Recorded: 2007-12-17 Pages: 2
Assignor
KOZAKAI, TOMOKAZU
Executed: 2007-11-20
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Working Method by Focused Ion Beam and Focused Ion Beam Working Apparatus
Patent: 7,750,318 →
Application: 11/918,171 →
Publication: US 2008/0302979
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →