Patent Assignment
Reel/Frame 020294/0187
Assignment of Assignor's Interest
Recorded: 2007-12-27
Pages: 2
Assignee
FUJIFILM CORPORATION
26-30, NISHIAZABU 2-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Pattern Forming Method, Resist Composition for Multiple Development Used in the Pattern Forming Method, Developer for Negative Development Used in the Pattern Forming Method, and Rinsing Solution for Negative Development Used in the Pattern Forming Method