IP Library › Assignment 020310/0179
Patent Assignment
Reel/Frame 020310/0179

Assignment of Assignor's Interest

Recorded: 2008-01-02 Pages: 3
Assignors
LIAO, CHIEN-MAO
Executed: 2007-04-24
SHIH, SHING-YIH
Executed: 2007-04-24
Assignee
NANYA TECHNOLOGY CORP.
HWA-YA TECHNOLOGY PARK 669, FUHSING 3 RD., KUEISHAN, TAO-YUAN HSIEN, TAIWAN
Covered Property (1)
Method for Forming a Shallow Trench Isolation
Patent: 8,207,065 →
Application: 11/968,621 →
Publication: US 2009/0029556