IP Library Assignment 020333/0962
Patent Assignment
Reel/Frame 020333/0962

Assignment of Assignor's Interest

Recorded: 2008-01-08 Pages: 4
Assignors
HOHAGE, JOERG
Executed: 2007-06-19
KAHLERT, VOLKER
Executed: 2007-06-19
RUELKE, HARTMUT
Executed: 2007-06-19
MAYER, ULRICH
Executed: 2007-06-19
Assignee
ADVANCED MICRO DEVICES, INC.
5204 EAST BEN WHITE BOULEVARD, AUSTIN, TEXAS, 78741
Covered Property (1)
Method of Forming a Dielectric Cap Layer for a Copper Metallization by Using a Hydrogen Based Thermal-Chemical Treatment
Patent: 8,211,795 →
Application: 11/970,876 →
Publication: US 2008/0286966