IP Library Assignment 020482/0028
Patent Assignment
Reel/Frame 020482/0028

Assignment of Assignor's Interest

Recorded: 2008-02-04 Pages: 2
Assignors
LEE, DOO-YOUL
Executed: 2008-01-14
KWAK, PAN-SUK
Executed: 2008-01-14
JUNG, SUNG-GON
Executed: 2008-01-14
LEE, JUNG-HYEON
Executed: 2008-01-14
LEE, SUK-JOO
Executed: 2008-01-14
KOH, CHA-WON
Executed: 2008-01-14
LEE, JI-YOUNG
Executed: 2008-01-14
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416, MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Method for Forming Fine Patterns of a Semiconductor Device Using a Double Patterning Process
Patent: 7,892,982 →
Application: 11/978,718 →
Publication: US 2008/0124931