IP Library Assignment 020526/0308
Patent Assignment
Reel/Frame 020526/0308

Assignment of Assignor's Interest

Recorded: 2008-01-29 Pages: 5
Assignors
YEH, GUAN-HUA
Executed: 2007-01-18
WU, HONG-GI
Executed: 2007-01-18
HUANG, JUNG-LUNG
Executed: 2007-01-18
Assignee
INNOLUX DISPLAY CORP.
NO. 160 KESYUE RD., CHU-NAN SITE, HSINCHU SCIENCE PARK, CHU-NAN 350, MIAO-LI COUNTY, R.O.C., TAIWAN
Covered Property (1)
Method for fabricating polysilicon layer with large and uniform grains
Application: 12/011,804 →
Publication: US 2008/0182392
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Apr 13, 2014
From: INNOLUX DISPLAY CORP.
To: CHIMEI INNOLUX CORPORATION
Reel/Frame 032672/0685 →
Change of Name Apr 13, 2014
From: CHIMEI INNOLUX CORPORATION
To: INNOLUX CORPORATION
Reel/Frame 032672/0746 →