IP Library › Assignment 020562/0359
Patent Assignment
Reel/Frame 020562/0359

Assignment of Assignor's Interest

Recorded: 2008-02-13 Pages: 2
Assignors
MORI, MASAHITO
Executed: 2008-01-30
KOFUJI, NAOYUKI
Executed: 2008-01-30
ITABASHI, NAOSHI
Executed: 2008-01-30
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-14, NISHI SHIMBASHI, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Method and Plasma Processing Apparatus
Patent: 8,129,283 →
Application: 12/068,889 →
Publication: US 2008/0190893
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →