IP Library Assignment 020592/0781
Patent Assignment
Reel/Frame 020592/0781

Assignment of Assignor's Interest

Recorded: 2008-03-03 Pages: 2
Assignors
HAYASHIDA, AKIRA
Executed: 2008-02-26
UENO, MASAAKI
Executed: 2008-02-22
SHIMADA, MASAKAZU
Executed: 2008-02-26
ABURATANI, YUKINORI
Executed: 2008-02-25
YAMADA, TOMOYUKI
Executed: 2008-02-22
NAKASHIMA, SEIYO
Executed: 2008-02-25
SUGISHITA, MASASHI
Executed: 2008-02-22
Assignee
HITACHI KOKUSAI ELECTRIC INC.
14-1, SOTOKANDA 4-CHOME, CHIYODA-KU, TOKYO 101-8980, JAPAN
Covered Property (1)
Substrate Processing Apparatus Having Gas Side Flow via Gas Inlet
Patent: 7,700,054 →
Application: 11/987,493 →
Publication: US 2008/0153314
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 31, 2018
From: HITACHI KOKUSAI ELECTRIC INC.
To: KOKUSAI ELECTRIC CORPORATION
Reel/Frame 048008/0206 →