Patent Assignment
Reel/Frame 020605/0692
Assignment of Assignor's Interest
Recorded: 2008-03-06
Pages: 11
Assignors
YE, JIANHUI
Executed: 2007-12-12
LIU, HUANG
Executed: 2007-11-06
SEE, ALEX KH
Executed: 2007-11-05
LU, WEI
Executed: 2007-11-06
LOW, CHUN HUI
Executed: 2007-11-06
SEET, CHIM SENG
Executed: 2007-11-06
ZHOU, MEI SHENG
Executed: 2007-11-06
HSIA, LIANG CHOO
Executed: 2007-11-06
Assignee
CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
60 WOODLANDS INDUSTRIAL PARK D STREET 2, SINGAPORE, 738406, SINGAPORE
Covered Property
(1)
Method of Forming High-K Dielectric Stop Layer for Contact Hole Opening
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Dec 13, 2012
From: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 029458/0819 →
Change of Name
Dec 13, 2012
From: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
To: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
Reel/Frame 029458/0826 →
Assignment of Assignor's Interest
Jul 2, 2019
From: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
To: ALSEPHINA INNOVATIONS INC.
Reel/Frame 049669/0775 →
Release of Security Interest
Nov 19, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 054481/0673 →