IP Library Assignment 020728/0018
Patent Assignment
Reel/Frame 020728/0018

Assignment of Assignor's Interest

Recorded: 2008-03-31 Pages: 5
Assignors
PARK, JEONG-MIN
Executed: 2008-03-12
JUNG, DOO-HEE
Executed: 2008-03-12
LEE, HI-KUK
Executed: 2008-03-12
YOUN, HYOC-MIN
Executed: 2008-03-12
KOO, KI-HYUK
Executed: 2008-03-12
Assignees
SAMSUNG ELECTRONICS CO., LTD.
416, MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
DONGJIN SEMICHEM CO., LTD.
SEOPYUNG B/D, 146-8, DONGKYO-DONG, MAPO-GU, SEOUL, KOREA, REPUBLIC OF
Covered Property (1)
Photoresist Composition and Method of Forming a Photoresist Pattern Using the Same
Patent: 7,989,136 →
Application: 12/059,113 →
Publication: US 2009/0042127
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 27, 2012
From: SAMSUNG ELECTRONICS CO., LTD.
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 029093/0177 →