IP Library Assignment 021037/0009
Patent Assignment
Reel/Frame 021037/0009

Assignment of Assignor's Interest

Recorded: 2008-05-23 Pages: 3
Assignors
TADA, MUNEHIRO
Executed: 2008-05-20
FURUTAKE, NAOYA
Executed: 2008-05-20
TAKEUCHI, TSUNEO
Executed: 2008-05-20
HAYASHI, YOSHIHIRO
Executed: 2008-05-20
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Formation Method of Porous Insulating Film, Manufacturing Apparatus of Semiconductor Device, Manufacturing Method of Semiconductor Device, and Semiconductor Device
Patent: 7,923,384 →
Application: 12/085,469 →
Publication: US 2009/0039474
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 12, 2013
From: NEC CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 030784/0197 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →