IP Library Assignment 021061/0239
Patent Assignment
Reel/Frame 021061/0239

Assignment of Assignor's Interest

Recorded: 2008-06-06 Pages: 5
Assignors
CHU, SANFORD
Executed: 2008-06-02
LI, YISUO
Executed: 2008-06-02
ZHANG, GUOWEI
Executed: 2008-06-02
PURAKH, VERMA
Executed: 2008-06-02
Assignee
CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
60 WOODLANDS INDUSTRIAL PARK D, STREET TWO, SINGAPORE, 738406, SINGAPORE
Covered Property (1)
High Performance Ldmos Device Having Enhanced Dielectric Strain Layer
Patent: 8,163,621 →
Application: 12/134,860 →
Publication: US 2009/0302385
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Aug 9, 2011
From: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
To: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
Reel/Frame 026723/0879 →
Change of Name Aug 9, 2011
From: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 026723/0908 →
Security Agreement Nov 27, 2018
From: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
To: WILMINGTON TRUST, NATIONAL ASSOCIATION
Reel/Frame 047660/0203 →
Release of Security Interest Nov 19, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 054481/0673 →