IP Library Assignment 021154/0021
Patent Assignment
Reel/Frame 021154/0021

Assignment of Assignor's Interest

Recorded: 2008-06-12 Pages: 3
Assignors
WATANABE, TSUKASA
Executed: 2008-04-08
SHINDO, NAOKI
Executed: 2008-04-11
ESHIMA, KAZUYOSHI
Executed: 2008-04-02
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Substrate Cleaning Method and Substrate Cleaning Apparatus
Patent: 8,083,857 →
Application: 12/213,011 →
Publication: US 2008/0308120