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Patent Assignment
Reel/Frame 021159/0844

Re-Record to Correct the Assignee on a Document Previously Recorded at Reel 020726, Frame 0364. (Assignment of Assignor's Interest)

Recorded: 2008-06-19 Pages: 3
Assignors
YASUI, NAOKI
Executed: 2008-02-06
WATANABE, SEIICHI
Executed: 2008-02-06
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-14, NISHI SHIMBASHI, MINATO-KU, TOKYO 105-8717, JAPAN
Covered Property (1)
Plasma Processing Method
Patent: 8,497,213 →
Application: 12/013,537 →
Publication: US 2008/0182419
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 31, 2008
From: YASUI, NAOKI; WATANABE, SEIICHI
To: HITACHI HIGH-TECHNOLOGIES CORPOARATION
Reel/Frame 020726/0364 →
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →