IP Library › Assignment 021361/0748
Patent Assignment
Reel/Frame 021361/0748

Assignment of Assignor's Interest

Recorded: 2008-08-08 Pages: 3
Assignors
CHEN, TAI CHIANG
Executed: 2008-08-04
WANG, XIN
Executed: 2008-08-04
Assignee
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
18 ZHANG JIANG ROAD, PUDONG NEW AREA, SHANGHAI, 201210, CHINA
Covered Property (1)
Method for Fabricating Semiconductor Device Capable of Adjusting the Thickness of Gate Oxide Layer
Patent: 7,759,238 →
Application: 12/187,370 →
Publication: US 2009/0042379