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Patent Assignment
Reel/Frame 021385/0263

Assignment of Assignor's Interest

Recorded: 2008-08-01 Pages: 3
Assignor
YAMAZAKI, SHUNPEI
Executed: 2008-07-25
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE ATSUGI-SHI, KANAGAWA-KEN, JAPAN
Covered Property (1)
Plasma Cvd Apparatus, Method for Manufacturing Microcrystalline Semiconductor Layer, and Method for Manufacturing Thin Film Transistor
Patent: 7,842,586 →
Application: 12/222,082 →
Publication: US 2009/0047774