IP Library › Assignment 021403/0191
Patent Assignment
Reel/Frame 021403/0191

Assignment of Assignor's Interest

Recorded: 2008-08-18 Pages: 3
Assignors
ICHINO, TAKAMASA
Executed: 2008-08-05
NISHIO, RYOJI
Executed: 2008-08-05
OBAMA, SHINJI
Executed: 2008-08-05
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 8,329,054 →
Application: 12/193,274 →
Publication: US 2009/0321391
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →