Patent Assignment
Reel/Frame 021571/0967
Assignment of Assignor's Interest
Recorded: 2008-09-22
Pages: 4
Assignors
TAKEYA, KOJI
Executed: 2008-09-17
FUSE, TAKASHI
Executed: 2008-09-17
KOTSUGI, TADASHI
Executed: 2008-09-17
PARKER, N. WILLIAM
Executed: 2008-09-19
Assignees
TOKYO ELECTRON
3-1 AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
MULTIBEAM SYSTEMS, INC.
2090 DUANE AVENUE, SANTA CLARA, CALIFORNIA, 95054-3306
Covered Property
(1)
Electron Beam Lithography Apparatus and Design Method of Patterned Beam-Defining Aperture
Application:
12/209,882 →
Publication:
US 2009/0008579
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Oct 7, 2008
From: TAKEYA, KOJI; FUSE, TAKASHI; KOTSUGI, TADASHI; PARKER, N. WILLIAM
To: TOKYO ELECTRON LIMITED; MULTRIBEAM SYSTEMS, INC.
Reel/Frame 021645/0834 →
Assignment of Assignor's Interest
May 6, 2010
From: MULTIBEAM SYSTEMS, INC.
To: MULTIBEAM CORPORATION
Reel/Frame 024342/0790 →